RASIRC products convert low vapor-pressure liquid chemistries into safer, reliable gases. These highly reactive chemistries generate thin oxide and nitride films at reduced temperatures for complex 3D structures in advanced microprocessors, memory, and III-V devices.

2025年1月8日 · RASIRC announced results from a recent study that shows a stable plasma can be made with hydrogen peroxide gas, enabling an extremely dense hydroxyl surface during semiconductor fabrication. The resulting improved wetting angle on HF last silicon was superior to oxygen or water alone.

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Have questions? Ready to get started with RASIRC? Get in touch with our team today!

Have questions? Ready to get started with RASIRC? Get in touch with our team today!

The RASIRC Peroxidizer provides a safe, reliable way to deliver bulk, high-concentration hydrogen peroxide gas into ALD, annealing, dry surface preparation and cleaning processes. Safely concentrates H202 from semiconductor grade 30% weight H202; Delivers H 2 O 2 gas at concentrations up to 50,000ppm; Compatible with carrier gas flowrates of 0 ...

The effect of interface between the insulator and the metal becomes increasingly significant as the insulator thickness scales beyond sub-5nm in Metal-Insulator-Metal (MIM) capacitors in memory applications.

Have questions? Ready to get started with RASIRC? Get in touch with our team today!

Have questions? Ready to get started with RASIRC? Get in touch with our team today!